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膜厚测量仪

膜厚测量仪(厚度范围1nm~1.8mm)Mprobe 20 台式膜厚测量仪MProbe 20 HC手持式膜厚测量仪(弯曲表面)激光干涉膜厚测量仪半导体/薄膜无损检测仪多波长椭偏仪/膜厚测量仪MPROBE 40 -MSP:小点薄膜厚度测量仪MPROBE 50 INSITU – 实时薄膜厚度测量仪MPROBE 60 薄膜厚度测量系统(精确定位测量)MPROBE 70 – 在线厚度测量 显示全部
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多波长椭偏仪/膜厚测量仪

  • 多波长椭偏仪/膜厚测量仪
  • 多波长椭偏仪/膜厚测量仪
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Film-Sense多波长椭偏仪

上海昊量光电推出的多波长椭偏仪采用长寿命的LED光源,可分别提供405nm、450nm、465nm、525nm、595nm、635nm、660nm、850nm、950nm六种不同波长,并使用无移动部件的椭偏仪,紧凑的系统提供快速可靠的薄膜测量。

通过1秒的测量可以精确的测量0-5000nm的大多数透明薄膜的厚度。并可以获得n和k等光学常量。

相比于单波长椭偏仪,多波长椭偏仪可测定薄膜厚度,对于透明薄膜测量厚度至少可达5μm,不存在厚度周期性问题;可确定样品其它其它参数特性例如薄膜粗糙度、多层膜厚度等;对数据分析提供检测依据,一个良好的分析模型应该适用于不同波长的数据;对于薄的薄膜(<10nm)多波长椭偏仪提供的数据信息量可以与光谱椭偏仪相媲美。

 

 

应用案例:

原位测量:

                          AUTFS-1 Mounted on Kurt Lesker ALD Chamber                                                              AUT FS-1 Mounted on AJA Sputter Chamber


选配件:

1聚焦选项:将样品上的光束缩小至0.8 x 1.9 mm 或0.3 x 0.7 mm

2、聚焦束检验选项

    3、自动Mapping系统


产品特点

  •  多波长

  • 椭偏检测器中无移动部件

  • 优异的测量精度(优于0.001nm)

  • 可原位测量

   

客户感言:

“These FS-1 ellipsometers are one of the best upgrades to our atomic layer processing reactors, and have now become an integral part of all our experiments on ALD and ALE.”

 ——Dr. Sumit Agarwal - Colorado School of Mines 

“这些FS-1椭圆仪是我们原子层处理反应堆的最佳升级之一,现在已经成为我们所有ALD和ALE实验的组成部分”

 ——Sumit Agarwal博士-科罗拉多矿业学院


“The Film Sense FS-1 in situ ellipsometer has greatly facilitated data acquisition and understanding of the thin film deposition processes in our lab. The instrument was relatively easy to incorporate onto a vacuum chamber, and includes a user-friendly manual and tutorial to explain basic operation. With this tool, we are able to collect much more information during a deposition, including measurements between ALD half-cycles that are not feasible with ex situ techniques. These ellipsometers have become an integral part of our laboratory research, and we look forward to continuing to work with Film Sense in the future."

——Rachel Nye, PhD - student in Chemical Engineering     Parsons Research Group, North Carolina State University

“薄膜传感FS-1原位椭圆仪极大地促进了我们实验室的数据采集和对薄膜沉积过程的理解。该仪器相对容易合并到真空室,并包括一个用户友好的手册和教程来解释基本操作。有了这个工具,我们可以在沉积过程中收集更多的信息,包括在ALD半个周期之间的测量,而这在原位技术中是不可实现的。这些椭圆计已经成为我们实验室研究不可或缺的一部分,我们期待着在未来继续与Film Sense合作。”

 —— 瑞秋·奈,化学工程博士生  帕森斯研究小组,北卡罗莱纳州立大学


“Overall performance, affordability and ease of use has made the FS-1 a workhorse for our ALD process as well as equipment development efforts.  The next generation FS-1EX provides a combination of higher beam intensity and wider spectral range improving both precision and accuracy.  For metallic thin films such as TiN, Pt and Ru, two additional IR wavelengths enhance the ability to monitor film thickness and resistivity in-situ during growth.  This enhanced performance helps us to streamline development efforts by effectively understanding the impact of different process conditions on film quality in real-time.”

——Bruce Rayner - Principal Scientist       Atomic Layer Deposition, Kurt J. Lesker Company

“FS-1的整体性能、可承受性和易用性使其成为我们ALD工艺和设备开发的主力。下一代FS-1EX提供了更高的光束强度和